NEXTILE U1 is designed as a metal platen replacement pad, specializing in chemical resistance and wear resistance for lapping applications. It is particularly effective when used with diamond slurry on hard-to-machine materials, such as SiC substrates and single crystal sapphire substrates, achieving excellent material removal rates, flatness, and a finish close to a mirror-like quality in lapping processes.
NEXTILE U1 is designed as a metal platen replacement pad, specializing in chemical resistance and wear resistance for lapping applications. It is particularly effective when used with diamond slurry on hard-to-machine materials, such as SiC substrates and single crystal sapphire substrates, achieving excellent material removal rates, flatness, and a finish close to a mirror-like quality in lapping processes.
